K. A. Ellis - Concepedia

Author

K. A. Ellis

Cornell University

Also Known As

K. A. Ellis, K. Ellis, K.A. Ellis

Publications

530

Citations

H-Index

Concepts

All Affiliations

Cornell University

About

K. A. Ellis is an author at Cornell University specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	10	10	403
2	Applied Physics	9	9	367
3	Natural Sciences	5	5	225
4	Health Sciences	1	1	10
5	Biomedical Engineering	1	1	10

K. A. Ellis

Publications

507

Citations

H-Index

Page 1

	Year	Citations
N depth profiles in thin SiO2 grown or processed in N2O: The role of atomic oxygen Elizabeth C. Carr, K. A. Ellis, R. A. Buhrman Applied Physics Letters Oxide HeterostructuresMaterials ScienceChemical EngineeringN Depth ProfilesAtomic Oxygen	1995	107
Ultrahigh frequency permeability of sputtered Fe–Co–B thin films T. J. Klemmer, K. A. Ellis, L. H. Chen, Journal of Applied Physics Ultrahigh Frequency PermeabilityMagnetic PropertiesEngineeringMagnetic ResonanceMagnetic Materials	2000	107
Furnace gas-phase chemistry of silicon oxynitridation in N2O K. A. Ellis, R. A. Buhrman Applied Physics Letters	1996	59
Boron Diffusion in Silicon Oxides and Oxynitrides K. A. Ellis, R. A. Buhrman Journal of The Electrochemical Society SemiconductorsDiffusion PathwaysSemiconductor TechnologyBoron DiffusionEngineering	1998	45
Nitrous oxide (N <sub>2</sub> O) processing for silicon oxynitride gate dielectrics K. A. Ellis, R. A. Buhrman IBM Journal of Research and Development	1999	45
Synthesis and Surface Energy Measurement of Semi-Fluorinated, Low-Energy Surfaces S. Perutz, J. Wang, E. J. Kramer, Macromolecules Materials ScienceSurface CharacterizationEngineeringSurface FunctionalizationFluorocarbon Segment	1998	36
Time-dependent diffusivity of boron in silicon oxide and oxynitride K. A. Ellis, R. A. Buhrman Applied Physics Letters Boron NitrideEngineeringPhysicsNanoelectronicsSecondary Species	1999	31
Soft-magnetic properties of Fe–Co–B thin films for ultra-high-frequency applications L. H. Chen, T. J. Klemmer, K. A. Ellis, Journal of Applied Physics Magnetic PropertiesEngineeringMagnetic MaterialsMagnetismHigh Hk	2000	29
The removal of nitrogen during boron indiffusion in silicon gate oxynitrides K. A. Ellis, R. A. Buhrman Applied Physics Letters Materials EngineeringMaterials ScienceChemical EngineeringSilicon Gate OxynitridesBoron Diffusion	1996	14
Ferromagnetic resonance frequency of a thin Mo-permalloy film T. J. Klemmer, K. A. Ellis, B. van Dover Journal of Applied Physics EngineeringMagnetic ResonanceMagnetic MaterialsMagnetismFerromagnetic Resonance Frequency	2000	13

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