Chiu-Chih Chiang

Physical and Barrier Properties of Amorphous Silicon-Oxycarbide Deposited by PECVD from Octamethylcyclotetrasiloxane

Chiu-Chih Chiang, Mao‐Chieh Chen, Lain‐Jong Li et al. · Journal of The Electrochemical Society · 2004 · 26 citations · Full text

Engineering, Thin Film Process Technology, Chemistry +16

Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiC:H Films from Trimethylsilane and Tetramethylsilane

Chiu-Chih Chiang, Mao‐Chieh Chen, Chung-Chi Ko et al. · Japanese Journal of Applied Physics · 2003 · 25 citations

Materials Science, High Temperature Materials, Engineering +15

Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiCN:H Films with Different Hydrogen Contents

Chiu-Chih Chiang, Mao‐Chieh Chen, Chung-Chi Ko et al. · Japanese Journal of Applied Physics · 2003 · 23 citations

Engineering, Plasma Processing, Semiconductors +17

Physical and Electrical Characteristics of Methylsilane- and Trimethylsilane-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

Zhen-Cheng Wu, Zhi-Wen Shiung, Chiu-Chih Chiang et al. · Journal of The Electrochemical Society · 2001 · 23 citations

Materials Science, Electrical Characteristics, Electrical Engineering +14

Physical and Electrical Characteristics of F- and C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

Zhen-Cheng Wu, Zhi-Wen Shiung, Chiu-Chih Chiang et al. · Journal of The Electrochemical Society · 2001 · 23 citations

Engineering, Glass Material, Electrical Characteristics +16