T. Ishitani - Concepedia

Author

T. Ishitani

Hitachi (Japan)

Also Known As

Ishitani, Thoru, T Ishitani, T. ISHITANI, T. Ishitani

Publications

1.1K

Citations

H-Index

Concepts

All Affiliations

Hitachi (Japan)The University of Osaka Tokushima University

About

T. Ishitani is an author at Hitachi (Japan) specializing in engineering, applied physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	18	26	880
2	Natural Sciences	6	6	127
3	Medicine	2	2	23
4	Education	1	1	12
5	Health Sciences	1	1	11

T. Ishitani

Publications

988

Citations

H-Index

Page 1

	Year	Citations
Computer simulation of atomic mixing during ion bombardment T. Ishitani, Ryōsuke Shimizu Applied Physics A EngineeringPhysicsPlasma SimulationAtomic PhysicsIon Beam	1975	132
Improvements in performance of focused ion beam cross-sectioning: aspects of ion-sample interaction T. Ishitani Journal of Electron Microscopy EngineeringMicroscopyCross-sectional SamplesIon-sample InteractionFib Cross-sectioning	2004	89
Round Robin computer simulation of ejection probability in sputtering Peter Sigmund, M. T. Robinson, M. I. Baskes, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Ejection ProbabilityEngineeringMonte CarloMonte Carlo MethodNumerical Simulation	1989	87
Transmission Electron Microscope Sample Preparation Using a Focused Ion Beam T. Ishitani, Hideki Tsuboi, Toshie Yaguchi, Journal of Electron Microscopy Materials ScienceElectrical EngineeringIon ImplantationEngineeringElectron Microscopy	1994	57
Computer simulation of knock-on effect under ion bombardment T. Ishitani, Ryōsuke Shimizu Physics Letters A EngineeringPhysicsPlasma SimulationIon BeamIon Emission	1974	49
Simulation Study on Image Contrast and Spatial Resolution in Helium Ion Microscope K. Inai, Kaoru Ohya Kaoru Ohya, T. Ishitani Journal of Electron Microscopy	2007	48
Implanted gallium-ion concentrations of focused-ion-beam prepared cross sections T. Ishitani, H. Koike, Toshie Yaguchi, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceIon ImplantationEngineeringCross SectionsApplied Physics	1998	44
Comments on ?The equilibrium topography of sputtered amorphous solids? T. Ishitani, Masahiro Kato, Ryuichi Shimizu Journal of Materials Science EngineeringPhysicsEquilibrium TopographyApplied PhysicsSolid Mechanics	1974	39
Comparison of secondary electron emission in helium ion microscope with gallium ion and electron microscopes K. Ohya, T. Yamanaka, K. Inai, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Electron MicroscopesEngineeringElectron MicroscopyPhysicsMicroscopy	2008	37
Focused-ion-beam ‘‘cutter’’ and ‘‘attacher’’ for micromachining and device transplantation T. Ishitani, Tsuyoshi Ohnishi, Y. Madokoro, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceIon ImplantationEngineeringMicromachinesMicrofabrication	1991	30

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