Joong S. Jeon

Electrochemistry of Chemical Vapor Deposited Tungsten Films with Relevance to Chemical Mechanical Polishing

E. A. Kneer, Raghunath Chilkunda, Srini Raghavan et al. · Journal of The Electrochemical Society · 1996 · 72 citations

Engineering, Electrode-electrolyte Interface, Tungsten Films +18

Electrochemical Measurements during the Chemical Mechanical Polishing of Tungsten Thin Films

E. A. Kneer, Varughese Mathew, S. Raghavan et al. · Journal of The Electrochemical Society · 1997 · 69 citations

Tungsten Removal, Polishing Tool, Engineering +24

A Comparative Electrochemical Study of Copper Deposition onto Silicon from Dilute and Buffered Hydrofluoric Acids

G. Li, E. A. Kneer, Bert Vermeire et al. · Journal of The Electrochemical Society · 1998 · 35 citations

Engineering, Chemistry, Chemical Deposition +17

Electrochemical Investigation of Copper Contamination on Silicon Wafers from HF Solutions

Joong S. Jeon, Srini Raghavan, H.G. Parks et al. · Journal of The Electrochemical Society · 1996 · 35 citations

Electrochemical Investigation, Dc Electrochemical Techniques, Electrical Engineering +13

Effect of Temperature on the Interaction of Silicon with Nonionic Surfactants in Alkaline Solutions

Joong S. Jeon, Srini Raghavan, J. P. Carrejo · Journal of The Electrochemical Society · 1996 · 27 citations

Engineering, Surfactants, Nonionic Surfactants +18