A. Hurst

The effect of end and edge shape on the performance of pseudo-spin valve memories

J. Gadbois, J.-G. Zhu, W. Vavra et al. · IEEE Transactions on Magnetics · 1998 · 95 citations

Engineering, Electrical Engineering, Memory +6

High rate dry etching of Ni0.8Fe0.2 and NiFeCo

K. B. Jung, E. S. Lambers, J. R. Childress et al. · Applied Physics Letters · 1997 · 40 citations

Natural Sciences, Materials Engineering, Materials Science +17

Relative merits of Cl2 and CO/NH3 plasma chemistries for dry etching of magnetic random access memory device elements

K. B. Jung, H. Cho, Yoon‐Bong Hahn et al. · Journal of Applied Physics · 1999 · 39 citations

Natural Sciences, Materials Engineering, Materials Science +17

Field programmable logic gates using GMR devices

M. Hassoun, W.C. Black, E.K.F. Lee et al. · IEEE Transactions on Magnetics · 1997 · 30 citations

Engineering, Computer Engineering, Electrical Engineering +13

Development of electron cyclotron resonance and inductively coupled plasma high density plasma etching for patterning of NiFe and NiFeCo

K. B. Jung, E. S. Lambers, J. R. Childress et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 26 citations

Natural Sciences, Materials Engineering, Materials Science +16