Concepedia

Hyo‐Jin Yun

HY

5

Publications

129

Citations

5

H-Index

2000

Active since

Affiliations

Korea Advanced Institute of Science and Technology(Current)

Samsung (South Korea)

Hyo‐Jin Yun is an author at Korea Advanced Institute of Science and Technology specializing in engineering, chemistry, and materials science.

Top concepts

EngineeringChemistryMaterial SciencePolymersPhotochemistryPolymer ScienceMicrofabricationOrganic ChemistryPolymer ChemistryMolecular Engineering

Publications per year

2000–2021

5

Publications

5

Novel Molecular Resist Based on Derivative of Cholic Acid

Jin-Baek Kim, Hyo‐Jin Yun, Young‐Gil Kwon · Chemistry Letters · 2002 · 46 citations

Engineering, Electron-beam Lithography, Chemistry +17

Synthesis of ArF photoresist polymer composed of three methacrylate monomers via reversible addition-fragmentation chain transfer (RAFT) polymerization

Hae-Sung Sohn, Sang‐Ho Cha, Won‐Ki Lee et al. · Macromolecular Research · 2011 · 35 citations

Methacrylate Monomers, Engineering, Macromolecular Engineering +11

Photobleachable silicon-containing molecular resist for deep UV lithography

Jin-Baek Kim, Ramakrishnan Ganesan, Jae‐Hak Choi et al. · Journal of Materials Chemistry · 2006 · 25 citations

Materials Science, Engineering, Beam Lithography +15

Novel Approach to Highly Robust Fine Pitch RDL Process

Ju-il Choi, Jeongi Jin, Gyuho Kang et al. · 2021 · 13 citations

Engineering, Novel Approach, Advanced Manufacturing +25

193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid

Jin-Baek Kim, Bum-Wook Lee, Hyo‐Jin Yun et al. · Chemistry Letters · 2000 · 10 citations

Engineering, Electron-beam Lithography, 193-Nm Photoresists +16

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