K. Yoshikawa

Thickness scaling limitation factors of ONO interpoly dielectric for nonvolatile memory devices

S. Mori, Yuta Araki, Masaki Sato et al. · IEEE Transactions on Electron Devices · 1996 · 76 citations

Engineering, Electrical Engineering, Materials Science +17

Degradation mechanism of flash EEPROM programming after program/erase cycles

Shigeru Yamada, Y. Hiura, Takeshi Yamane et al. · 2002 · 67 citations

Engineering, Computer Engineering, Electrical Engineering +14

Anomalous effects on hot-electron transport and ablation structure

Takashi Yabe, K. Mima, K. Yoshikawa et al. · Nuclear Fusion · 1981 · 58 citations

Natural Sciences, Physics, Heat Transfer +16

ONO inter-poly dielectric scaling for nonvolatile memory applications

S. Mori, E. Sakagami, Hirohiko Araki et al. · IEEE Transactions on Electron Devices · 1991 · 58 citations

Engineering, Electrical Engineering, Materials Science +17

Skin pigmentation associated with minocycline therapy

N. Okada, Keiichi Moriya, K. Nishida et al. · British Journal of Dermatology · 1989 · 58 citations

Medicine, Dermatology, Pathology +16