Wen-Hsien Tu

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Active since

2011

Affiliations

National Institutes of Applied Research(Current)

National Taiwan University

University of California, Berkeley

Wen-Hsien Tu is an author at National Institutes of Applied Research specializing in materials science, semiconductor materials, and semiconductor devices.

Publications per year

2011–2015

Publications

Junctionless Gate-All-Around pFETs Using <italic>In-situ</italic> Boron-Doped Ge Channel on Si

I-Hsieh Wong, Yen‐Ting Chen, Shih-Hsien Huang et al. · IEEE Transactions on Nanotechnology · 2015 · 29 citations

Engineering, Electrical Engineering, Materials Science +16

Nearly defect-free Ge gate-all-around FETs on Si substrates

Shu‐Han Hsu, Chun-Lin Chu, Wen-Hsien Tu et al. · 2011 · 24 citations

Engineering, Electrical Engineering, Materials Science +12

Triangular-channel Ge NFETs on Si with (111) sidewall-enhanced I<inf>on</inf> and nearly defect-free channels

Shu‐Han Hsu, Hung‐Chih Chang, Chun-Lin Chu et al. · 2012 · 17 citations

Engineering, Electrical Engineering, Materials Science +12

The pn Junctions of Epitaxial Germanium on Silicon by Solid Phase Doping

Wen-Hsien Tu, Shu‐Han Hsu, C. W. Liu · IEEE Transactions on Electron Devices · 2014 · 11 citations

Engineering, Materials Engineering, Materials Science +17

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