Tomiyuki Arakawa

Highly Reliable Thin Nitrided SiO₂ Films Formed by Rapid Thermal Processing in an N₂O Ambient

Hisashi Fukuda, Tomiyuki Arakawa, Seigo Ohno · Japanese Journal of Applied Physics · 1990 · 106 citations

Materials Science, Materials Engineering, Chemical Engineering +15

Preparation of Co2FeSn Heusler alloys by electrodeposition method

Nobuaki Watanabe, Katsuhito Sano, Naoya Tasugi et al. · APL Materials · 2015 · 18 citations · Full text

Effect of Nitrogen Profile on Tunnel Oxynitride Degradation with Charge Injection Polarity

Tomiyuki Arakawa, Ryoichi Matsumoto, A. Kita · Japanese Journal of Applied Physics · 1996 · 15 citations

Polarity Dependence, Engineering, Tunnel Oxynitride Degradation +19

Influence of the Memory Effect on X-ray Photoelectron Spectroscopy and Raman Scattering in Positive Electrode of Ni-MH Batteries

Nobuaki Watanabe, Tomiyuki Arakawa, Yasushi Sasaki et al. · Journal of The Electrochemical Society · 2012 · 12 citations

Materials Science, Crystal Structure, Electrical Engineering +14

Relationship between Nitrogen Profile and Reliability of Heavily Oxynitrided Tunnel Oxide Films for Flash Electrically Erasable and Programmable ROMs

Tomiyuki Arakawa, Takahisa Hayashi, Morifumi Ohno et al. · Japanese Journal of Applied Physics · 1995 · 12 citations

Non-volatile Memory, Engineering, Dry Oxidation +18