Takashi Hirao Takashi Hirao

Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma

Masashi Goto, Hirotaka Toyoda Hirotaka Toyoda, Masatoshi Kitagawa et al. · Japanese Journal of Applied Physics · 1997 · 82 citations

Engineering, Polycrystalline Silicon Films, Plasma Physics +19

Low-Temperature Preparation of Pb(Zr, Ti)O₃ Thin Films on (Pb, La)TiO₃ Buffer Layer by Multi-Ion-Beam Sputtering

Isaku Kanno, Shigenori Hayashi, Takeshi Kamada et al. · Japanese Journal of Applied Physics · 1993 · 71 citations

Engineering, Low-temperature Preparation, Thin Film Process Technology +20

Crystallographic Orientations of MgO Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Eiji Fujii, Atsushi Tomozawa, Satoru Fujii et al. · Japanese Journal of Applied Physics · 1994 · 20 citations

Materials Engineering, Materials Science, Mgo Films Prepared +13

Characterization of Pb(Zr, Ti)O₃ Thin Films Prepared by Multi-Ion-Beam Sputtering

Isaku Kanno, Shigenori Hayashi, Takeshi Kamada et al. · Japanese Journal of Applied Physics · 1994 · 16 citations

Materials Science, Engineering, Bulk Pzt +10

Preparation and Characterization of Pb-Based Ferroelectric Thin Films

Shigenori Hayashi, Kenji Iijima, Takashi Hirao Takashi Hirao · Japanese Journal of Applied Physics · 1991 · 13 citations

Materials Science, Engineering, Ferroelectric Application +15