Hoi-Sung Chung

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Active since

2006

Affiliations

Korea Advanced Institute of Science and Technology(Current)

Hoi-Sung Chung is an author at Korea Advanced Institute of Science and Technology specializing in atomic layer deposition, electronic materials, and materials engineering.

ORCID

Publications per year

2006–2007

Publications

TiO[sub 2]∕Al[sub 2]O[sub 3]∕TiO[sub 2] Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition

Woojin Jeon, Hoi-Sung Chung, Dae-Kwon Joo et al. · Electrochemical and Solid-State Letters · 2007 · 48 citations

Natural Sciences, Materials Engineering, Materials Science +17

Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N[sub 2]∕H[sub 2]∕Ar Plasma

Hoi-Sung Chung, Jung‐Dae Kwon, Sang‐Won Kang · Journal of The Electrochemical Society · 2006 · 22 citations

Natural Sciences, Materials Engineering, Materials Science +16

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