Woong‐Chul Shin

Oxide interfacial phases and the electrical properties of SrBi2Ta2O9 thin films prepared by plasma-enhanced metalorganic chemical vapor deposition

Nack-Jin Seong, Cheol‐Hoon Yang, Woong‐Chul Shin et al. · Applied Physics Letters · 1998 · 64 citations

Natural Sciences, Materials Engineering, Materials Science +17

Characterization of RuO2 Thin Films Prepared by Hot‐Wall Metallorganic Chemical Vapor Deposition

Woong‐Chul Shin, Soon‐Gil Yoon · Journal of The Electrochemical Society · 1997 · 63 citations

Natural Sciences, Materials Engineering, Materials Science +17

Effect of Annealing Conditions on a Hafnium Oxide Reinforced SiO[sub 2] Gate Dielectric Deposited by Plasma-Enhanced Metallorganic CVD

Kyu-Jeong Choi, Woong‐Chul Shin, Soon‐Gil Yoon · Journal of The Electrochemical Society · 2002 · 55 citations

Natural Sciences, Materials Engineering, Materials Science +17

Crystallization Behavior and Physical Properties of Sb-Excess Ge[sub 2]Sb[sub 2+x]Te[sub 5] Thin Films for Phase Change Memory (PCM) Devices

Sang Ouk Ryu, Sung‐Min Yoon, Kyu Jeong Choi et al. · Journal of The Electrochemical Society · 2006 · 50 citations

Natural Sciences, Materials Science, Physics +16

Water-Soluble Structure H Clathrate Hydrate Formers

Woong‐Chul Shin, Seongmin Park, Dong‐Yeun Koh et al. · The Journal of Physical Chemistry C · 2011 · 48 citations

Natural Sciences, Chemistry, Materials Chemistry +10