Dong‐Gun Kim

Controlling the Electrical Characteristics of ZrO₂/Al₂O₃/ZrO₂ Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition

Cheol Hyun An, Woongkyu Lee, Sang Hyeon Kim et al. · physica status solidi (RRL) - Rapid Research Letters · 2018 · 43 citations

Materials Science, Electrical Characteristics, Electrical Engineering +13

Synthesis of hollow structured PtNi/Pt core/shell and Pt-only nanoparticles via galvanic displacement and selective etching for efficient oxygen reduction reaction

Jae Young Jung, Dong‐Gun Kim, Injoon Jang et al. · Journal of Industrial and Engineering Chemistry · 2022 · 27 citations

Materials Science, Oxygen Reduction Reaction, Chemical Engineering +9

Scaling the Equivalent Oxide Thickness by Employing a TiO₂ Thin Film on a ZrO₂–Al₂O₃‐Based Dielectric for Further Scaling of Dynamic Random Access Memory

Soon Hyung, Cheol Hyun An, Seong Tak Cho et al. · physica status solidi (RRL) - Rapid Research Letters · 2019 · 24 citations

Materials Science, Non-volatile Memory, Electrical Engineering +15

Effect of Growth Temperature during the Atomic Layer Deposition of the SrTiO₃ Seed Layer on the Properties of RuO₂/SrTiO₃/Ru Capacitors for Dynamic Random Access Memory Applications

Sang Hyeon Kim, Woongkyu Lee, Cheol Hyun An et al. · ACS Applied Materials & Interfaces · 2018 · 23 citations

Atomic Rearrangement in Core–Shell Catalysts Induced by Electrochemical Activation for Favorable Oxygen Reduction in Acid Electrolytes

Daeil Choi, Jae Young Jung, M. J. Lee et al. · ACS Catalysis · 2021 · 16 citations

Materials Science, Oxygen Reduction Reaction, Chemical Engineering +14