C. L. Yang

Process development of high-k metal gate aluminum CMP at 28nm technology node

Yeh-Hsin Hsien, H. K. Hsu, T.C. Tsai et al. · Microelectronic Engineering · 2011 · 34 citations

Materials Science, Technology Node, Electrical Engineering +9

Defect reduction of replacement metal gate aluminum chemical mechanical planarization at 28nm technology node

H. K. Hsu, T.C. Tsai, Chia Wei Hsu et al. · Microelectronic Engineering · 2013 · 15 citations

Technology Node, Electrical Engineering, Engineering +5

Benefits of cryo-implantation for 28 nm NMOS advanced junction formation

C. L. Yang, C. I. Li, G. P. Lin et al. · Semiconductor Science and Technology · 2012 · 14 citations

Engineering, Vlsi Design, Computer Architecture +16

A Novel “hybrid” high-k/metal gate process for 28nm high performance CMOSFETs

C. T. Lin, Liwei Cheng, Che-Hua Hsu et al. · 2009 · 12 citations

Low-power Electronics, Electrical Engineering, Engineering +13

A 28nm poly/SiON CMOS technology for low-power SoC applications

C. W. Liang, Miaodi Chen, J. Jenq et al. · Symposium on VLSI Technology · 2011 · 12 citations

Low-power Electronics, Electrical Engineering, Engineering +11