G. Schaarschmidt

The position of the fundamental absorption edge and activation energies for thermally activated electrical conductivity in amorphous carbon layers

M. Vogel, O. Stenzel, Ralf Petrich et al. · Thin Solid Films · 1993 · 25 citations

Materials Science, Electrical Engineering, Engineering +9

Deposition of diamond on patterned silicon substrates

A. Flöter, G. Schaarschmidt, B. Mainz et al. · Diamond and Related Materials · 1995 · 16 citations

Materials Science, Diamond-like Carbon, Engineering +6

Fundamental mechanisms of titanium nitride formation by d.c. magnetron sputtering

Frank Richter, H. Küpfer, H. Giegengack et al. · Surface and Coatings Technology · 1992 · 16 citations

Materials Science, Materials Engineering, Boron Nitride +9

Optical properties of amorphous hydrogenated carbon layers deposited by an ion plating technique

O. Stenzel, G. Schaarschmidt, Franziska M. Wolf et al. · Thin Solid Films · 1991 · 15 citations

Materials Science, Diamond-like Carbon, Optical Materials +10

Plasma and particle flux characterization of the a-C:H deposition process by ion-assisted methods

G. Schaarschmidt, Frank Scholze, S. Porsch et al. · Materials Science and Engineering A · 1991 · 12 citations

Ion-assisted Methods, H Deposition Process, Chemical Engineering +7