Concepedia

Tatsuo Asamaki

TA

9

Publications

264

Citations

9

H-Index

1974

Active since

Affiliations

Canon Anelva (Japan)(Current)

Tokyo University of Science

Tatsuo Asamaki is an author at Canon Anelva (Japan) specializing in engineering, applied physics, and surface science.

Top concepts

EngineeringApplied PhysicsSurface ScienceMaterial ScienceThin FilmsMicroelectronicsMaterials EngineeringPhysicsMicrofabricationElectrical Engineering

Publications per year

1974–1994

9

Publications

9

RF Sputter-Etching by Fluoro-Chloro-Hydrocarbon Gases

Naokichi Hosokawa, Reisaku Matsuzaki, Tatsuo Asamaki · Japanese Journal of Applied Physics · 1974 · 107 citations

Materials Science, Materials Engineering, Chemical Engineering +15

Epitaxial Growth of Al on Si by Gas-Temperature-Controlled Chemical Vapor Deposition

Tsukasa Kobayashi, Atsushi Sekiguchi, Naokichi Hosokawa et al. · Japanese Journal of Applied Physics · 1988 · 45 citations

Materials Engineering, Materials Science, Aluminium Nitride +14

Growth of Al films by gas-temperature-controlled chemical vapor deposition

Tsukasa Kobayashi, Atsushi Sekiguchi, Naoto Akiyama et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 20 citations

Materials Science, Materials Engineering, Aluminium Nitride +11

High-vacuum planar magnetron discharge

Tatsuo Asamaki, Tsutomu Miura, Gen Nakamura et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 19 citations

Electrical Engineering, Engineering, Discharge Space +9

Gas-Temperature-Controlled (GTC) CVD of Aluminum and Aluminum-Silicon Alloy Film for VLSI Processing

Atsushi Sekiguchi, Tsukasa Kobayashi, Naokichi Hosokawa et al. · Japanese Journal of Applied Physics · 1988 · 18 citations

Materials Engineering, Materials Science, Vlsi Processing +15

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