Concepedia

M. Hasunuma

MH

6

Publications

87

Citations

6

H-Index

1993

Active since

Affiliations

Toshiba (Japan)(Current)

M. Hasunuma is an author at Toshiba (Japan) specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceMaterials EngineeringSurface ScienceElectrical EngineeringMicrostructureMicroelectronicsCrystalline DefectsMechanics Of Materials

Publications per year

1993–2008

6

Publications

6

Electromigration-induced void growth in bamboo structures

T. Kawanoue, H. Kaneko, M. Hasunuma et al. · Journal of Applied Physics · 1993 · 18 citations

Aluminium Nitride, Engineering, Mechanics Of Materials +18

Improvement in the electromigration lifetime using hyper-textured aluminum formed on amorphous tantalum-aluminum underlayer

Hiroshi Toyoda, T. Kawanoue, M. Hasunuma et al. · 1994 · 18 citations

Hyper-textured Aluminum, Aluminium Nitride, Engineering +19

Single crystal aluminum lines with excellent endurance against stress induced failure

M. Hasunuma, H. Kaneko, Atsuhito Sawabe et al. · 2003 · 16 citations

Engineering, Single-crystal Al Lines, Microstructure-strength Relationship +21

A newly developed model for stress induced slit-like voiding

H. Kaneko, M. Hasunuma, Atsuhito Sawabe et al. · 2002 · 15 citations

Thermodynamic Analysis, Engineering, Severe Plastic Deformation +22

Impact of Residual Impurities on Annealing Properties of Vacancies in Electroplated Cu Studied Using Monoenergetic Positron Beams

Akira Uedono, Kazuteru Mori, Kenichi Ito et al. · Japanese Journal of Applied Physics · 2007 · 10 citations

Cu Films, Engineering, Residual Impurities +17

Rows per page

1–5 of 6