Concepedia

W. Futako

WF

Statistics

Publications

13

Citations

338

H-Index

12

Active since

1996

Affiliations

Tokyo Institute of Technology(Current)

National Institute of Advanced Industrial Science and Technology

Japan Science and Technology Agency

W. Futako is an author at Tokyo Institute of Technology specializing in materials science, materials engineering, and natural sciences.

Publications per year

1996–2004

13

Publications

13

Role of the hydrogen plasma treatment in layer-by-layer deposition of microcrystalline silicon

K. Saitoh, Michio Kondo, Makoto Fukawa et al. · Applied Physics Letters · 1997 · 64 citations

Engineering, Materials Engineering, Materials Science +16

Band gap tuning of a-Si:H from 1.55 eV to 2.10 eV by intentionally promoting structural relaxation

Kazuhiko Fukutani, M. Kanbe, W. Futako et al. · Journal of Non-Crystalline Solids · 1998 · 46 citations

Natural Sciences, Materials Science, Physics +14

Wide band gap amorphous silicon thin films prepared by chemical annealing

W. Futako, K. Yoshino, C.M. Fortmann et al. · Journal of Applied Physics · 1999 · 42 citations

Natural Sciences, Materials Engineering, Materials Science +17

Homoepitaxial growth and characterization of phosphorus-doped diamond using tertiarybutylphosphine as a doping source

Hiromitsu Kato, W. Futako, Satoshi Yamasaki et al. · Diamond and Related Materials · 2004 · 30 citations

Natural Sciences, Materials Engineering, Materials Science +13

Fabrication of narrow-band-gap hydrogenated amorphous silicon by chemical annealing

W. Futako, Shinya Takeoka, C.M. Fortmann et al. · Journal of Applied Physics · 1998 · 28 citations · Full text

Natural Sciences, Materials Science, Physics +17

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