E. I. Alessandrini

Statistics

Publications

Citations

339

H-Index

Active since

1963

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

IBM (United States)

E. I. Alessandrini is an author at IBM Research - Thomas J. Watson Research Center specializing in materials science, natural sciences, and thin films.

Publications per year

1963–1985

Publications

Epitaxial Growth of Nickel Silicide NiSi<sub>2</sub>on Silicon

K. N. Tu, E. I. Alessandrini, W.K. Chu et al. · Japanese Journal of Applied Physics · 1974 · 96 citations

Engineering, Materials Engineering, Materials Science +16

Resistivity-noise measurements in thin gold films near the percolation threshold

R. H. Koch, R. B. Laibowitz, E. I. Alessandrini et al. · Physical review. B, Condensed matter · 1985 · 59 citations

Natural Sciences, Electrical Engineering, Physics +17

Effect of Varying Oxidizing and Nitriding Parameters on the Surface of Cr Thin Films

E. I. Alessandrini, V. Brusić · Journal of Vacuum Science and Technology · 1972 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +17

Relationship between Structure and Sputtering Parameters in NbN Films

E. I. Alessandrini, V. Sadagopan, R. B. Laibowitz · Journal of Vacuum Science and Technology · 1971 · 25 citations

Natural Sciences, Materials Engineering, Materials Science +13

Surface reactions on MOS structures

E. I. Alessandrini, David R. Campbell, K. N. Tu · Journal of Applied Physics · 1974 · 25 citations

Natural Sciences, Chemistry, Materials Science +17

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