Concepedia
Statistics
Publications
3
Citations
51
H-Index
Active since
2007
Affiliations
The University of Osaka(Current)
Canon Anelva (Japan)
National Institute of Advanced Industrial Science and Technology
Motomu Kosuda is an author at The University of Osaka specializing in dielectrics, gate dielectrics, and semiconductor device materials.
Publications per year
2007–2008
Charge trapping properties in TiO2∕HfSiO∕SiO2 gate stacks probed by scanning capacitance microscopy
Yuichi Naitou, Hiroaki Arimura, Naomu Kitano et al. · Applied Physics Letters · 2008 · 18 citations · Full text
Engineering, Materials Engineering, Materials Science +17
Excellent electrical properties of TiO2∕HfSiO∕SiO2 layered higher-k gate dielectrics with sub-1nm equivalent oxide thickness
Hiroaki Arimura, Naomu Kitano, Yuichi Naitou et al. · Applied Physics Letters · 2008 · 18 citations · Full text
Engineering, Electrical Engineering, Materials Science +17
Impact of Physical Vapor Deposition-Based In situ Fabrication Method on Metal/High-k Gate Stacks
Heiji Watanabe, Shinya Horie, T. Minami et al. · Japanese Journal of Applied Physics · 2007 · 15 citations
Natural Sciences, Materials Engineering, Materials Science +17
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