Hideo Ohtsuki - Concepedia

Author

Hideo Ohtsuki

Tokyo Institute of Technology

Also Known As

H Ohtsuki, H. Ohtsuki, Hideo Ohtsuki

Publications

243

Citations

H-Index

Concepts

All Affiliations

Tokyo Institute of Technology Takeda (Japan)

About

Hideo Ohtsuki is an author at Tokyo Institute of Technology specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	177
2	Applied Physics	8	8	177
3	Electrical Engineering	4	4	98
4	Chemical Engineering	1	1	13
5	Materials Engineering	1	1	52

Hideo Ohtsuki

Publications

188

Citations

H-Index

Page 1

	Year	Citations
Vertical and Smooth Etching of InP by Cl<sub>2</sub>/Xe Inductively Coupled Plasma Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama, Japanese Journal of Applied Physics EngineeringElectron-beam LithographyPlasma SciencePlasma PhysicsOptoelectronic Devices	1999	52
Highly angular dependent high-contrast grating mirror and its application for transverse-mode control of VCSELs Shunya Inoue, Junichi Kashino, Akihiro Matsutani, Japanese Journal of Applied Physics PhotonicsSemiconductor Multilayer MirrorsEngineeringDiffractive OpticOptical Properties	2014	38
Mass Effect of Etching Gases in Vertical and Smooth Dry Etching of InP Akihiro Matsutani, Hideo Ohtsuki, Seiichi Muta, Japanese Journal of Applied Physics Mass EffectEngineeringVacuum DeviceSicl 4Plasma Processing	2001	20
Plasma Diagnostics in Inductively Coupled Plasma Etching Using Cl<sub>2</sub>/Xe Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama, Japanese Journal of Applied Physics Plasma CharacteristicsEngineeringApplied PhysicsPlasma PhysicsAnalytical Chemistry	2000	16
Iodine Solid Source Inductively Coupled Plasma Etching of InP Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama Japanese Journal of Applied Physics Materials ScienceIodine GasElectrical EngineeringEngineeringMicrofabrication	2005	14
Emission Spectrochemical Analysis in Dry Etching Process of InP by Cl<sub>2</sub> Inductively Coupled Plasma Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama, Japanese Journal of Applied Physics Materials ScienceChemical EngineeringEngineeringOptical DiagnosticsSpectroscopy	2000	13
Low-Temperature Dry Etching of InP by Inductively Coupled Plasma Using HI/Cl<sub>2</sub> Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama Japanese Journal of Applied Physics Materials ScienceElectrical EngineeringPlasma ElectronicsResist MaskEngineering	2003	12
Generation of Solid-Source H<sub>2</sub>O Plasma and Its Application to Dry Etching of CaF<sub>2</sub> Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama Japanese Journal of Applied Physics Optical MaterialsEngineeringLaser ApplicationsPlasma PhysicsPlasma Processing	2008	12
Smooth and Vertical Profile Dry Etching of Si Using XeF<sub>2</sub> Plasma Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama Japanese Journal of Applied Physics	2009	11

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