Nan-Tzu Lian

Pattern dependent plasma charging effect in high aspect ratio 3D NAND architecture

Zusing Yang, Yao-An Chung, Sheng‐Yuan Chang et al. · 2016 · 21 citations

Engineering, Computer Engineering, Electrical Engineering +17

Investigation of shape etching on multi-layer SiO<inf>2</inf>/poly-Si for 3D NAND architecture

Zusing Yang, Fang-Hao Hsu, Lo Yueh Lin et al. · 2013 · 12 citations

Engineering, Electrical Engineering, Materials Science +17

A high-endurance (≫100K) BE-SONOS NAND flash with a robust nitrided tunnel oxide/si interface

Szu-Yu Wang, Hang-Ting Lue, Tzu‐Hsuan Hsu et al. · 2010 · 12 citations

Engineering, Computer Engineering, Electrical Engineering +17

Etch Defect Characterization and Reduction in Hard-Mask-Based Al Interconnect Etching

Hong-Ji Lee, Che‐Lun Hung, Chia-Hao Leng et al. · International Journal of Plasma Science and Engineering · 2008 · 11 citations · Full text

Engineering, Materials Engineering, Materials Science +14

Study of Plasma Arcing Mechanism in High Aspect Ratio Slit Trench Etching

Yao-An Chung, Cheng-Yi Lung, Yuan-Chieh Chiu et al. · 2019 · 11 citations

Engineering, Electrical Engineering, Materials Science +17