M. El-Bouanani

5 nm ruthenium thin film as a directly plateable copper diffusion barrier

Tiruchirapalli Arunagiri, Y. Zhang, Oliver Chyan et al. · Applied Physics Letters · 2005 · 180 citations

Materials Science, Ruthenium Film, Material Analysis +11

Hafnium interdiffusion studies from hafnium silicate into silicon

Manuel Quevedo-López, M. El-Bouanani, S. Addepalli et al. · Applied Physics Letters · 2001 · 80 citations

Materials Engineering, Materials Science, Chemical Etching +13

Effect of N incorporation on boron penetration from p+ polycrystalline-Si through HfSixOy films

Manuel Quevedo-López, M. El-Bouanani, M. J. Kim et al. · Applied Physics Letters · 2003 · 59 citations

Hfsixoy Crystallization, Engineering, Hfsixoynz Films +19

Interdiffusion studies for HfSixOy and ZrSixOy on Si

Manuel Quevedo-López, M. El-Bouanani, Bruce E. Gnade et al. · Journal of Applied Physics · 2002 · 51 citations

Engineering, Silicon On Insulator, Metal Incorporation +16

Boron penetration studies from p+ polycrystalline Si through HfSixOy

Manuel Quevedo-López, M. El-Bouanani, M. J. Kim et al. · Applied Physics Letters · 2002 · 47 citations

Materials Engineering, Materials Science, Hfsixoy Crystallization +13