Panart Khajornrungruang

Study on effect of the surface variation of colloidal silica abrasive during chemical mechanical polishing of sapphire

Natthaphon Bun-Athuek, Yutaka Yoshimoto, Koya Sakai et al. · Japanese Journal of Applied Physics · 2017 · 16 citations

Engineering, Mechanical Engineering, Colloidal Silica Particles +16

Study on fine particle behavior in slurry flow between wafer and polishing pad as a material removal process in CMP

Keiichi Kimura, Keisuke Suzuki, Panart Khajornrungruang · 2012 · 15 citations

Materials Science, Engineering, Material Processing +12

Light scattering model for individual sub-100-nm particle size determination in an evanescent field

Panart Khajornrungruang, Sevim Korkmaz, Angshuman Pal et al. · Japanese Journal of Applied Physics · 2016 · 14 citations

Nanoparticles, Engineering, Microscopy +27

Effects of mixed ultrafine colloidal silica particles on chemical mechanical polishing of sapphire

Natthaphon Bun-Athuek, Hiroko Takazaki, Yutaka Yoshimoto et al. · Japanese Journal of Applied Physics · 2018 · 13 citations

Colloidal Material, Engineering, Mechanical Engineering +16

Real Time Nanoscale Cleaning Phenomenon Observation during PVA Brush Scrubbing by Evanescent Field

Yutaka TERAYAMA, Panart Khajornrungruang, Keisuke Suzuki et al. · ECS Transactions · 2019 · 13 citations

Materials Science, Self-cleaning Surface, Engineering +15