Venkata R. K. Gorantla

Citric Acid as a Complexing Agent in CMP of Copper

Venkata R. K. Gorantla, K.A. Assiongbon, S. V. Babu et al. · Journal of The Electrochemical Society · 2005 · 80 citations

Materials Science, Inorganic Chemistry, Chemical Engineering +14

Role of Amine and Carboxyl Functional Groups of Complexing Agents in Slurries for Chemical Mechanical Polishing of Copper

Venkata R. K. Gorantla, Dan V. Goia, Egon Matijević et al. · Journal of The Electrochemical Society · 2005 · 54 citations

Engineering, Copper Oxide Powders, Chemistry +19

Oxalic Acid as a Complexing Agent in CMP Slurries for Copper

Venkata R. K. Gorantla, Ashok K. Babel, S. Pandija et al. · Electrochemical and Solid-State Letters · 2005 · 54 citations

Engineering, Cmp Slurries, Green Chemistry +16

Amino Acids as Complexing Agents in Chemical−Mechanical Planarization of Copper

Venkata R. K. Gorantla, Egon Matijević, S. V. Babu · Chemistry of Materials · 2005 · 49 citations

Chemical Engineering, Biological Inorganic Chemistry, Engineering +12

Effects of mixed abrasives in chemical mechanical polishing of oxide films

Zhenyu Lu, Seungho Lee, Venkata R. K. Gorantla et al. · Journal of materials research/Pratt's guide to venture capital sources · 2003 · 28 citations

Materials Engineering, Materials Science, Chemical Engineering +12