Ehud Fuchs

Next generation of extreme-resolution electron beam lithography

John N. Randall, James H. G. Owen, Joseph Lake et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2019 · 40 citations · Full text

Engineering, Electron-beam Lithography, Microscopy +21

Multimode hydrogen depassivation lithography: A method for optimizing atomically precise write times

Joshua B. Ballard, T. W. Sisson, James H. G. Owen et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2013 · 32 citations

Engineering, Electron-beam Lithography, Microscopy +21

Digital atomic scale fabrication an inverse Moore's Law – A path to atomically precise manufacturing

John N. Randall, James H. G. Owen, Ehud Fuchs et al. · Micro and Nano Engineering · 2018 · 29 citations · Full text

Pattern transfer of hydrogen depassivation lithography patterns into silicon with atomically traceable placement and size control

Joshua B. Ballard, James H. G. Owen, William R. Owen et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2014 · 24 citations

Engineering, Electron-beam Lithography, Nanodevices +25

Highly parallel scanning tunneling microscope based hydrogen depassivation lithography

John N. Randall, James H. G. Owen, Joseph Lake et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2018 · 20 citations · Full text

Engineering, Electron-beam Lithography, Microscopy +18