Felix Mitschker

PEALD of SiO₂ and Al₂O₃ Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads

M. Gebhard, Lukas Mai, Lars Banko et al. · ACS Applied Materials & Interfaces · 2018 · 54 citations

Natural Sciences, Materials Engineering, Materials Science +17

From Precursor Chemistry to Gas Sensors: Plasma‐Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applications

Lukas Mai, Felix Mitschker, Claudia Bock et al. · Small · 2020 · 41 citations · Full text

Natural Sciences, Chemistry, Materials Engineering +17

Characterization of low-pressure microwave and radio frequency discharges in oxygen applying optical emission spectroscopy and multipole resonance probe

Simon Steves, Tim Styrnoll, Felix Mitschker et al. · Journal of Physics D Applied Physics · 2013 · 39 citations

Natural Sciences, Materials Engineering, Materials Science +15

An efficient PE-ALD process for TiO₂ thin films employing a new Ti-precursor

M. Gebhard, Felix Mitschker, Martin Wiesing et al. · Journal of Materials Chemistry C · 2016 · 31 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +15

The effect of UV radiation from oxygen and argon plasma on the adhesion of organosilicon coatings on polypropylene

Montgomery Jaritz, Henrik Behm, Christian Hopmann et al. · Journal of Physics D Applied Physics · 2016 · 31 citations

Natural Sciences, Materials Engineering, Materials Science +17