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Nigamananda Samal

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Statistics

Publications

2

Citations

32

H-Index

2

Active since

2012

Affiliations

Veeco (United States)(Current)

Nigamananda Samal is an author at Veeco (United States) specializing in microelectronics, chemical engineering, and high temperature materials.

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Publications per year

2012–2013

2

Publications

2

Low-temperature (≤200 <b>°</b>C) plasma enhanced atomic layer deposition of dense titanium nitride thin films

Nigamananda Samal, Hui Du, Russell Luberoff et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2012 · 22 citations

, , +19

Low-temperature (≤150 °C) chemical vapor deposition of pure cobalt thin films

Nigamananda Samal, K. B. Chetry, Katrina Rook et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2013 · 10 citations

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