P. G. Bower

Sub-20-nm-wide metal lines by electron-beam exposure of thin poly(methyl methacrylate) films and liftoff

S. P. Beaumont, P. G. Bower, Toshiaki Tamamura et al. · Applied Physics Letters · 1981 · 63 citations

Engineering, Electron-beam Lithography, Sub-20-nm-wide Metal Lines +17

New inorganic electron resist system for high resolution lithography

Bismark Singh, S. P. Beaumont, P. G. Bower et al. · Applied Physics Letters · 1982 · 30 citations

Engineering, Electron-beam Lithography, Metal Nanoparticles +19

Sub-50-nm lithography in amorphous Se-Ge inorganic resist by electron beam exposure

Bismark Singh, S.P. Beaumont, P. G. Bower et al. · Applied Physics Letters · 1982 · 23 citations

Sub-50-nm Lithography, Engineering, Electron-beam Lithography +16

High resolution patterning with Ag2S/As2S3 inorganic electron-beam resist and reactive ion etching

Budhi Singh, S.P. Beaumont, Andrew M. Webb et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1983 · 12 citations

High Resolution, Engineering, Electron-beam Lithography +22