Prodyut Majumder

Investigation on the diffusion barrier properties of sputtered Mo∕W–N thin films in Cu interconnects

Prodyut Majumder, Christos G. Takoudis · Applied Physics Letters · 2007 · 45 citations

Engineering, Diffusion Barrier Properties, Thin Film Process Technology +16

Atomic Layer Deposition of Y[sub 2]O[sub 3] Films on Silicon Using Tris(ethylcyclopentadienyl) Yttrium Precursor and Water Vapor

Prodyut Majumder, Gregory Jursich, Adam Kueltzo et al. · Journal of The Electrochemical Society · 2008 · 41 citations

Materials Science, Materials Engineering, Engineering +14

Structural phase transformation of Y2O3 doped HfO2 films grown on Si using atomic layer deposition

Prodyut Majumder, Gregory Jursich, Christos G. Takoudis · Journal of Applied Physics · 2009 · 39 citations

Engineering, Thin Film Process Technology, Hfo2 Films +16

Atomic Layer Deposited Ultrathin HfO[sub 2] and Al[sub 2]O[sub 3] Films as Diffusion Barriers in Copper Interconnects

Prodyut Majumder, Rajesh Katamreddy, Christos G. Takoudis · Electrochemical and Solid-State Letters · 2007 · 35 citations

Aluminium Nitride, Engineering, Atomic Layer +16

Effect of film thickness on the breakdown temperature of atomic layer deposited ultrathin HfO2 and Al2O3 diffusion barriers in copper metallization

Prodyut Majumder, Rajesh Katamreddy, Christos G. Takoudis · Journal of Crystal Growth · 2007 · 27 citations

Materials Science, Materials Engineering, Epitaxial Growth +12