Amica Miyamura - Concepedia

Author

Amica Miyamura

Aoyama Gakuin University

Also Known As

A. Miyamura, Amica MIYAMURA, Amica Miyamura

Publications

345

Citations

H-Index

Concepts

All Affiliations

Aoyama Gakuin University National Institute of Advanced Industrial Science and Technology

About

Amica Miyamura is an author at Aoyama Gakuin University specializing in engineering, materials science, and thin films.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	5	5	291
2	Materials Science	5	5	291
3	Applied Physics	4	4	249
4	Chemistry	1	1	42
5	Electrical Engineering	1	1	38

Amica Miyamura

Publications

326

Citations

H-Index

Page 1

	Year	Citations
Thermal transport properties of polycrystalline tin-doped indium oxide films Toru Ashida, Amica Miyamura, Nobuto Oka, Journal of Applied Physics Optical MaterialsEngineeringThermal Transport PropertiesOptoelectronic DevicesThin Film Process Technology	2009	126
Thermophysical properties of aluminum oxide and molybdenum layered films Nobuto Oka, Ryo Arisawa, Amica Miyamura, Thin Solid Films Materials ScienceEngineeringAluminum OxideOxide ElectronicsSurface Science	2009	44
Effects of internal stress on photocatalytic properties of TiO2 films Amica Miyamura, Kenji Kaneda, Yasushi Sato, Thin Solid Films Materials ScienceEngineeringPhotochemistryInorganic PhotochemistryPhotocatalysis	2007	42
Comparative study on early stages of film growth for transparent conductive oxide films deposited by dc magnetron sputtering Yasushi Sato, Mikihiro Taketomo, Norihiro Ito, Thin Solid Films Materials ScienceEngineeringEarly StagesNanoelectronicsOxide Electronics	2007	41
Effect of electrical properties on thermal diffusivity of amorphous indium zinc oxide films Toru Ashida, Amica Miyamura, Yasushi Sato, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Thin Film PhysicsEngineeringThin Film Process TechnologyIzo FilmsThermal Diffusivity	2007	38
High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems Shin Ohno, Yoshinobu Kawaguchi, Amica Miyamura, Science and Technology of Advanced Materials	2006	23
Ti–Al–Si–N films for superhard coatings deposited by reactive cosputtering using Ti, Al, and Si targets Amica Miyamura, Mitsugu Yamaguchi, Koichiro Hattori, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films	2007	12

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