Concepedia

Tim D. Bestwick

TD

6

Publications

185

Citations

6

H-Index

1989

Active since

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

Tim D. Bestwick is an author at IBM Research - Thomas J. Watson Research Center specializing in applied physics, engineering, and microfabrication.

Top concepts

EngineeringApplied PhysicsMaterial ScienceMicroelectronicsMicrofabricationSurface ScienceMaterials EngineeringOptoelectronicsChemical EngineeringPhysics

Publications per year

1989–2002

6

Publications

6

Reactive ion etching of silicon using bromine containing plasmas

Tim D. Bestwick, G. S. Oehrlein · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 72 citations

Materials Science, Chemical Engineering, Engineering +12

Cryogenic reactive ion etching of silicon in SF6

Tim D. Bestwick, G. S. Oehrlein, David Angell · Applied Physics Letters · 1990 · 32 citations

Materials Science, Materials Engineering, Electrode Surface +15

Tungsten etching mechanisms in CF4/O2 reactive ion etching plasmas

Tim D. Bestwick, G. S. Oehrlein · Journal of Applied Physics · 1989 · 28 citations

Materials Engineering, Materials Science, Chemical Engineering +15

Uniform and efficient GaAs/AlGaAs quantum dots

Tim D. Bestwick, Martin D. Dawson, Alistair H. Kean et al. · Applied Physics Letters · 1995 · 22 citations

Materials Science, Photoluminescence, Engineering +13

Reactive ion etching of SiGe alloys using HBr

Tim D. Bestwick, G. S. Oehrlein, Ying Zhang et al. · Applied Physics Letters · 1991 · 20 citations · Full text

Materials Engineering, Materials Science, Etched Sige Alloys +10

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