Concepedia

N. Klein

NK

31

Publications

1.5K

Citations

23

H-Index

1966

Active since

Affiliations

Technion – Israel Institute of Technology(Current)

IBM Research - Thomas J. Watson Research Center

N. Klein is an author at Technion – Israel Institute of Technology specializing in engineering, electrical engineering, and applied physics.

Top concepts

EngineeringApplied PhysicsElectrical EngineeringElectrical InsulationPhysicsMicroelectronicsMaterial ScienceThin FilmsThermodynamicsCondensed Matter Physics

Publications per year

1966–2018

31

Publications

31

The maximum dielectric strength of thin silicon oxide films

N. Klein, H. Gafni · IEEE Transactions on Electron Devices · 1966 · 160 citations

Materials Engineering, Electrical Engineering, Engineering +13

The mechanism of self-healing electrical breakdown in MOS structures

N. Klein · IEEE Transactions on Electron Devices · 1966 · 136 citations

Materials Science, Self-healing Electrical Breakdown, Electrical Engineering +13

Switching and breakdown in films

N. Klein · Thin Solid Films · 1971 · 109 citations

Time-dependent Dielectric Breakdown, Thin Film Process Technology, Thin Films +2

Impact ionization in silicon dioxide at fields in the breakdown range

P. M. Solomon, N. Klein · Solid State Communications · 1975 · 102 citations

Breakdown Range, Electrical Engineering, Ion Implantation +9

Current runaway in insulators affected by impact ionization and recombination

N. Klein, P. M. Solomon · Journal of Applied Physics · 1976 · 101 citations

Electrical Engineering, Ion Implantation, Current Runaway +14

Rows per page

1–5 of 31