Akinobu Tanaka - Concepedia

Author

Akinobu Tanaka

NTT Basic Research Laboratories

Also Known As

A. TANAKA, A. Tanaka, Akinobu TANAKA, Akinobu Tanaka, Akinobu Tanaka Akinobu Tanaka

Publications

594

Citations

H-Index

Concepts

All Affiliations

NTT Basic Research Laboratories NTT (Japan)Saga University Nissan (Japan)

About

Akinobu Tanaka is an author at NTT Basic Research Laboratories specializing in materials science, engineering, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	14	479
2	Applied Physics	10	11	311
3	Chemistry	8	8	312
4	Chemical Engineering	7	7	362
5	Electrical Engineering	2	2	45

Akinobu Tanaka

Publications

479

Citations

H-Index

Page 1

	Year	Citations
Synthesis of metal ion substituted P2-Na2/3Ni1/3Mn2/3O2 cathode material with enhanced performance for Na ion batteries Wenwen Zhao, Hideyuki Kirie, Akinobu Tanaka, Materials Letters Materials ScienceChemical EngineeringEngineeringBattery Electrode MaterialsNa Ion Batteries	2014	95
Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography Jiro Nakamura, Hiroshi Ban, Kimiyoshi Deguchi, Japanese Journal of Applied Physics EngineeringElectron-beam LithographyMicroscopyChemistryChemical Engineering	1991	83
Enhanced electrochemical performance of Ti substituted P2-Na2/3Ni1/4Mn3/4O2 cathode material for sodium ion batteries Wenwen Zhao, Akinobu Tanaka, Kyoko Momosaki, Electrochimica Acta Materials ScienceChemical EngineeringEngineeringElectrochemical Power SourceAdvanced Electrode Material	2015	57
The Effect of an Organic Base in Chemically Amplified Resist on Patterning Characteristics Using KrF Lithography Yoshio Kawai, Akihiro Otaka, Akinobu Tanaka, Japanese Journal of Applied Physics Optical MaterialsEngineeringElectron-beam LithographyPattern TransferOptoelectronic Devices	1994	49
Influence of Acid Diffusion on the Lithographic Performance of Chemically Amplified Resists Jiro Nakamura, Hiroshi Ban, Akinobu Tanaka Japanese Journal of Applied Physics Materials ScienceCatalytic Acid DiffusionChemical EngineeringChemically Amplified ResistsEngineering	1992	46
A New Silicone‐Based Negative Resist (SNR) for Two‐Layer Resist System Masao Morita, Saburo Imamura, Akinobu Tanaka, Journal of The Electrochemical Society Optical MaterialsEngineeringHigh ResolutionOptoelectronic DevicesIntegrated Circuits	1984	32
Metal-free chemically amplified positive resist resolving 0.2 μm in x-ray lithography Hiroshi Ban, Jiro Nakamura, Kimiyoshi Deguchi, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena High ResolutionEngineeringElectron-beam LithographyChemistryPositive Resist	1991	22
Methacrylated silicone-based negative photoresist for high resolution bilayer resist systems Masao Morita, Akinobu Tanaka, Katsuhide Onose Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena EngineeringElectron-beam LithographyOptoelectronic DevicesIntegrated CircuitsNew Photoresist	1986	19
Synthesis of alkali-soluble silicone resin suitable for resist material in microlithography Hiroshi Ban, Akinobu Tanaka, Yoshio Kawai, Polymer Materials ScienceMaterials EngineeringWafer Scale ProcessingEngineeringBeam Lithography	1990	16
New Photoresist for High Resolution Two-Layer Resist Systems Akinobu Tanaka, Masao Morita, Katsuhide Onose Japanese Journal of Applied Physics Optical MaterialsEngineeringElectron-beam LithographyOptoelectronic DevicesIntegrated Circuits	1985	16

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