Concepedia

A. Fushida

AF

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Publications

2

Citations

65

H-Index

2

Active since

1997

Affiliations

Fujitsu (Japan)(Current)

A. Fushida is an author at Fujitsu (Japan) specializing in applied physics, engineering, and surface science.

Top concepts

Publications per year

1997–1999

2

Publications

2

A new leakage mechanism of Co salicide and optimized process conditions [for CMOS]

Ken Goto, A. Fushida, J. Watanabe et al. · IEEE Transactions on Electron Devices · 1999 · 43 citations

, , +14

Transmission Electron Microscopy Observation of CoSi<sub>x</sub> Spikes in Si Substrates during Co-silicidation Process

T. Sukegawa, Hirofumi Tomita, A. Fushida et al. · Japanese Journal of Applied Physics · 1997 · 22 citations

, , +14

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