J. Brudermann

High-power EUV lithography sources based on gas discharges and laser-produced plasmas

Uwe Stamm, Imtiaz Ahmad, István Balogh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 36 citations

Sn DPP source-collector modules: status of alpha resources, beta developments, and the scalability to HVM

Marc Corthout, R. Apetz, J. Brudermann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 16 citations

Short Wavelength Optic, Engineering, Nuclear Physics +16

EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology

Uwe Stamm, J. Kleinschmidt, K. Gäbel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 16 citations

Engineering, Electron-beam Lithography, Euv Lithography +20

EUV source power and lifetime: the most critical issues for EUV lithography

Uwe Stamm, J. Kleinschmidt, Kai Gaebel et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 15 citations

Optical Materials, Engineering, Critical Issues +17

Development status of EUV sources for use in beta-tools and high-volume chip manufacturing tools

Uwe Stamm, J. Kleinschmidt, D. Bolshukhin et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 12 citations