Heon-Do Kim

Growth studies and characterization of silicon nitride thin films deposited by alternating exposures to Si2Cl6 and NH3

Kwangchol Park, Won-Deok Yun, Byoungjun Choi et al. · Thin Solid Films · 2009 · 60 citations

Engineering, Materials Engineering, Materials Science +14

Oxidation Resistance of Sputtered Ti[sub 1-x]Al[sub x]N Films for Complementary Metal Oxide Semiconductor Storage Node Electrode Barriers

Sam-Dong Kim, In-Seok Hwang, Jin‐Koo Rhee et al. · Electrochemical and Solid-State Letters · 2001 · 15 citations

Natural Sciences, Materials Engineering, Materials Science +17

Characteristics of La$_2$O$_3$ Thin Films Deposited Using the ECR Atomic Layer Deposition Method

Woong-Sun Kim, Sang-Kyun Park, Dae-Yong Moon et al. · Journal of the Korean Physical Society · 2009 · 13 citations

Natural Sciences, Materials Engineering, Materials Science +14

Catalyzed Atomic Layer Deposition of Silicon Oxide at Ultralow Temperature Using Alkylamine

Tirta Rona Mayangsari, Jaemin Park, Luchana L. Yusup et al. · Langmuir · 2018 · 13 citations

Natural Sciences, Chemical Engineering, Chemistry +17