J. J. Chu

Effects of backsputtering and amorphous silicon capping layer on the formation of TiSi2 in sputtered Ti films on (001)Si by rapid thermal annealing

L. J. Chen, I‐Wen Wu, J. J. Chu et al. · Journal of Applied Physics · 1988 · 52 citations

Engineering, Materials Engineering, Materials Science +17

Single-Crystal Growth and Extremely High <i>H</i>_c2 of 12442-Type Fe-Based Superconductor KCa₂Fe₄As₄F₂

Teng Wang, J. J. Chu, Hua Jin et al. · The Journal of Physical Chemistry C · 2019 · 47 citations · Full text

Natural Sciences, Materials Science, Physics +17

Localized epitaxial growth of ReSi2 on (111) and (001) silicon

J. J. Chu, L. J. Chen, K. N. Tu · Journal of Applied Physics · 1987 · 33 citations

Engineering, Materials Engineering, Materials Science +16

Local epitaxy of TiSi2 on (111)Si: Effects due to rapid thermal annealing and to the annealing atmosphere

I. C. Wu, J. J. Chu, L. J. Chen · Journal of Applied Physics · 1986 · 33 citations

Engineering, Materials Engineering, Materials Science +17

Epitaxial Growth of High-T_c Bi-Ca-Sr-Cu-O Superconducting Layer by LPE Process

R. S. Liu, Yisheng Huang, Po‐Ting Wu et al. · Japanese Journal of Applied Physics · 1988 · 25 citations

Natural Sciences, Materials Science, Physics +14