Hiroyuki Fukumizu

Atomic layer etching of AlGaN using Cl2 and Ar gas chemistry and UV damage evaluation

Hiroyuki Fukumizu, Makoto Sekine, Masaru Hori et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 30 citations

Engineering, Materials Engineering, Materials Science +17

Initial growth analysis of ALD Al ₂ O ₃ film on hydrogen-terminated Si substrate via in situ XPS

Hiroyuki Fukumizu, Makoto Sekine, Masaru Hori et al. · Japanese Journal of Applied Physics · 2019 · 15 citations

Natural Sciences, Materials Engineering, Materials Science +14

Tunneling barrier height at defect sites on Si(001)

Hiroyuki Fukumizu, Shu Kurokawa, Akira Sakai · Surface Science · 1999 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +10

Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma

Keita Ichikawa, Manh Hung Chu, Makoto Moriyama et al. · Applied Physics Express · 2021 · 13 citations

Natural Sciences, Physics, Plasma Physics +6

High aspect ratio SiO₂/SiN (ON) stacked layer etching using C₃HF₅, C₄H₂F₆, and C₄H₄F₆

Chihiro Abe, Toshiyuki Sasaki, Yukishige Kondo et al. · Japanese Journal of Applied Physics · 2024 · 13 citations · Full text

Engineering, Materials Engineering, Materials Science +16