R. Vikrant - Concepedia

Author

R. Vikrant

Colorado School of Mines

Also Known As

R. Vikrant, Vikrant R. Rai

Publications

377

Citations

H-Index

Concepts

All Affiliations

Colorado School of Mines Eindhoven University of Technology Plasma (Macedonia)

About

R. Vikrant is an author at Colorado School of Mines specializing in chemistry, surface science, and engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	272
2	Applied Physics	4	4	165
3	Chemical Engineering	4	4	149
4	Natural Sciences	2	2	40
5	Health Sciences	1	1	58

R. Vikrant

Publications

377

Citations

H-Index

Page 1

	Year	Citations
Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide R. Vikrant, Vincent Vandalon, Sumit Agarwal Langmuir	2010	105
Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide R. Vikrant, Sumit Agarwal The Journal of Physical Chemistry C Materials ScienceMetal PrecursorEngineeringTitanium DioxideCorrosion	2009	65
Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone R. Vikrant, Vincent Vandalon, Sumit Agarwal Langmuir Aluminium NitrideEngineeringOxidation ResistanceChemistryChemical Deposition	2011	60
Surface Reaction Mechanisms during Ozone-Based Atomic Layer Deposition of Titanium Dioxide R. Vikrant, Sumit Agarwal The Journal of Physical Chemistry C EngineeringAtmospheric PhotochemistryOxidation ResistanceChemistryChemical Deposition	2008	58
Mechanism of Self-catalytic Atomic Layer Deposition of Silicon Dioxide Using 3-Aminopropyl Triethoxysilane, Water, and Ozone R. Vikrant, Sumit Agarwal Chemistry of Materials Materials ScienceChemical EngineeringEngineeringSurface FunctionalizationSurface Chemistry	2011	49
<i>In situ</i> diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition R. Vikrant, Sumit Agarwal Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringChemistryChemical DepositionSitu SurfaceChemical Engineering	2011	27
Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using <i>in situ</i> infrared reflection absorption spectroscopy Rohan P. Chaukulkar, Nick F. W. Thissen, R. Vikrant, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringChemistryChemical DepositionChemical EngineeringAtomic Layer Deposition	2013	13

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