Concepedia

T. Tsuruoka

TT

9

Publications

347

Citations

9

H-Index

1988

Active since

Affiliations

Oki Electric Industry (Japan)(Current)

T. Tsuruoka is an author at Oki Electric Industry (Japan) specializing in engineering, applied physics, and surface science.

Top concepts

EngineeringApplied PhysicsThin FilmsSurface ScienceMaterial ScienceMaterials EngineeringChemistryOptoelectronicsOptical PropertiesPhysics

Publications per year

1988–2010

9

Publications

9

Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition

Hiroaki Kakinuma, M. Mohri, Masaaki Sakamoto et al. · Journal of Applied Physics · 1991 · 118 citations

Engineering, Polycrystalline Silicon Films, Thin Film Process Technology +19

Y<sub>1</sub>Ba<sub>2</sub>Cu<sub>3</sub>O<sub>7-δ</sub> Film Formation by an OM-CVD Method

Hitoshi Abe, T. Tsuruoka, Tomohiro Nakamori · Japanese Journal of Applied Physics · 1988 · 59 citations

Materials Science, Materials Engineering, Epitaxial Growth +13

Y-Ba-Cu-O Film Growth by OMCVD Using N<sub>2</sub>O

T. Tsuruoka, Ryodo Kawasaki, Hitoshi Abe · Japanese Journal of Applied Physics · 1989 · 58 citations

Materials Science, Materials Engineering, Oxygen Source +11

Mechanism of low-temperature polycrystalline silicon growth from a SiF4/SiH4/H2 plasma

Hiroaki Kakinuma, M. Mohri, T. Tsuruoka · Journal of Applied Physics · 1995 · 32 citations

Materials Science, Materials Engineering, Chemical Engineering +14

Characteristics of quenched Y-Ba-Cu-O thin films on SrTiO3 (100),(110) grown by organometallic chemical vapor deposition

T. Tsuruoka, Hideyuki Takahashi, Ryodo Kawasaki et al. · Applied Physics Letters · 1989 · 22 citations

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