Michael Klick - Concepedia

Author

Michael Klick

Technical University of Munich ORCID

Also Known As

M. Klick, Michael Klick

Publications

347

Citations

H-Index

Concepts

All Affiliations

Technical University of Munich

About

Michael Klick is an author at Technical University of Munich specializing in engineering, electrical engineering, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	328
2	Electrical Engineering	7	7	298
3	Applied Physics	4	4	125
4	Physics	4	4	239
5	Natural Sciences	2	2	78

Michael Klick

Publications

328

Citations

H-Index

Page 1

	Year	Citations
Nonlinearity of the radio-frequency sheath Michael Klick Journal of Applied Physics Electrical EngineeringRadio-frequency SheathEngineeringRadio EngineeringPhysics	1996	116
Plasma Diagnostics in rf Discharges Using Nonlinear and Resonance Effects Michael Klick, Wolfgang Rehak, M. Kammeyer Japanese Journal of Applied Physics Resonance EffectsElectrical EngineeringEngineeringPhysicsHigh Sensitivity	1997	56
Skin effect in a small symmetrically driven capacitive discharge Thomas Mussenbrock, Torben Hemke, Dennis Ziegler, Plasma Sources Science and Technology EngineeringRadio FrequencyGlow DischargePlasma SciencePlasma Modeling	2008	45
Plasma monitoring and PECVD process control in thin film silicon-based solar cell manufacturing Onno Gabriel, Simon Kirner, Michael Klick, EPJ Photovoltaics EngineeringPhotovoltaic SystemPlasma ProcessingPhotovoltaicsPecvd Process	2014	35
Innovative plasma diagnostics and control of process in reactive low-temperature plasmas Michael Klick, M. Kammeyer, W. Rehak, Surface and Coatings Technology EngineeringLow-temperature PlasmasNonthermal PlasmaReactive Low-temperature PlasmasInnovative Plasma Diagnostics	1998	30
Electron heating in capacitively coupled discharges and reactive gases Gerhard Franz, Michael Klick Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringGlow DischargePlasma PhysicsDriven DischargesCl2 Increases	2005	22
Resistive model of the rf discharge including additional dc currents and electrodes Michael Klick Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics Electrical EngineeringSheath EdgesEngineeringRadio FrequencyRf Discharge	1993	12
Comprehensive understanding of chamber conditioning effects on plasma characteristics in an advanced capacitively coupled plasma etcher Kye Hyun Baek, Eunwoo Lee, Michael Klick, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Complementary Sensor DataElectrical EngineeringPlasma CharacteristicsEngineeringPlasma Electronics	2016	12

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