Y. Kurata - Concepedia

Author

Y. Kurata

Kanazawa University ORCID

Also Known As

Y Kurata, Y. Kurata, Yuto Kurata

Publications

1.6K

Citations

H-Index

Concepts

All Affiliations

Kanazawa University

About

Y. Kurata is an author at Kanazawa University specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	21	35	1.2K
2	Medicine	4	4	57
3	Health Sciences	1	1	17
4	Natural Sciences	1	1	24
5	Social Sciences	1	1	10

Y. Kurata

Publications

1.4K

Citations

H-Index

Page 1

	Year	Citations
Optical properties of Si clusters and Si nanocrystallites in high-temperature annealed SiOx films Tsubasa Inokuma, Yutaka Wakayama, T. Muramoto, Journal of Applied Physics Optical MaterialsEngineeringOptical AbsorptionOptoelectronic DevicesSilicon On Insulator	1998	174
Vibrational properties of SiO and SiH in amorphous SiO :H films (0 ≤ x ≤ 2.0) prepared by plasma-enhanced chemical vapor deposition Lirong He, Tsubasa Inokuma, Y. Kurata, Journal of Non-Crystalline Solids	1995	122
Optical properties of silicon nanocrystallites in polycrystalline silicon films prepared at low temperature by plasma-enhanced chemical vapor deposition Dmitry E. Milovzorov, Ameen M. Ali, Tsubasa Inokuma, Thin Solid Films Materials ScienceOptical MaterialsEngineeringOptical PropertiesSilicon On Insulator	2001	80
Connection between Si–N and Si–H vibrational properties in amorphous SiN<sub>x</sub>: H films S. Hasegawa, H. Anbutsu, Y. Kurata Philosophical Magazine B Materials ScienceSemiconductorsSi–h Vibrational PropertiesElectronic MaterialsCrystalline Defects	1989	69
Bonding properties of glow-discharge polycrystalline and amorphous Si-C films studied by x-ray diffraction and x-ray photoelectron spectroscopy T. Takeshita, Y. Kurata, S. Hasegawa Journal of Applied Physics Materials ScienceMaterials EngineeringEngineeringHeavy Hydrogen DilutionAmorphous Si-c Films	1992	69
ESR and electrical properties of P-doped microcrystalline Si S. Hasegawa, S. Narikawa, Y. Kurata Philosophical Magazine B	1983	68
Bonding configuration and defects in amorphous SiN<i>x</i>:H films S. Hasegawa, Masaaki Matsuda, Y. Kurata Applied Physics Letters Optical MaterialsEngineeringSolid-state ChemistryChemistryDensity Ns	1991	61
Amorphous SiN:H dielectrics with low density of defects S. Hasegawa, Masahide Matuura, Y. Kurata Applied Physics Letters Optical MaterialsEngineeringLow DensityThin Film Process TechnologyChemistry	1986	61
Structure and grain boundary defects of recrystallized silicon films prepared from amorphus silicon deposited using disilane S. Hasegawa, Sota Watanabe, Tsubasa Inokuma, Journal of Applied Physics Materials ScienceMaterials EngineeringEngineeringCrystalline DefectsFilm Thickness	1995	54
Effects of deposition temperature on polycrystalline silicon films using plasma-enhanced chemical vapor deposition S. Hasegawa, M. Sakata, Tsubasa Inokuma, Journal of Applied Physics EngineeringPolycrystalline Silicon FilmsThin Film Process TechnologyChemistryChemical Deposition	1998	49

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