Naoki Yoshii

Atmospheric Pressure Atomic Layer Epitaxy of ZnO Using a Chloride Source

Kazuhiko Kaiya, Naoki Yoshii, Kouji Omichi et al. · Chemistry of Materials · 2001 · 26 citations

Materials Science, Semiconductors, Optical Materials +10

Highly conformal and high-ionic conductivity thin-film electrolyte for 3D-structured micro batteries: Characterization of LiPON film deposited by MOCVD method

Takashi Fujibayashi, Yūsuke Kubota, Katsuhiko Iwabuchi et al. · AIP Advances · 2017 · 23 citations · Full text

Engineering, Electrode-electrolyte Interface, Mocvd-lipon Film +18

Atmospheric pressure atomic layer epitaxy of ZnO on a sapphire (0001) substrate by alternate reaction of ZnCl2 and O2

K. Kaiya, Naoki Yoshii, Naoki Takahashi et al. · Journal of Materials Science Letters · 2000 · 23 citations

Influence of Crystal Orientation of Ru Under-Layer on Initial Growth of Copper Chemical Vapor Deposition

Hoon Kim, Y. Kojima, Hiroshi Sato et al. · Japanese Journal of Applied Physics · 2006 · 22 citations

Engineering, Cvd Cu, Crystal Growth Technology +16

Self-limiting growth of ZrO2 films on a Si(100) substrate using ZrCl4 and O2 under atmospheric pressure

Naoyuki Takahashi, Naoki Yoshii, Shinichi Nonobe et al. · Journal of Electronic Materials · 2003 · 12 citations

Materials Science, Materials Engineering, Self-limiting Growth +10