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Self-limiting growth of ZrO2 films on a Si(100) substrate using ZrCl4 and O2 under atmospheric pressure

Materials ScienceMaterials EngineeringSelf-limiting GrowthEngineeringOxide ElectronicsSurface ScienceApplied PhysicsAtmospheric PressureThin FilmsEpitaxial GrowthChemical Vapor DepositionThin Film ProcessingZro2 Films