Statistics
Publications
4
Citations
58
H-Index
4
Active since
1999
Affiliations
Toshiba (Japan)(Current)
K. Hiyama is an author at Toshiba (Japan) specializing in microelectronics, gate oxide leakage, and semiconductor devices.
Publications per year
1999–2024
4
4
High performance 30 nm bulk CMOS for 65 nm technology node (CMOS5)
E. Morifuji, M. Kanda, N. Yanagiya et al. · 2003 · 12 citations
Engineering, Computer Engineering, Electrical Engineering +17
Preparation of Al Doped PZT Thin Films Using a Sol-Gel Method
Takashi Iijima, N. Sanada, K. Hiyama et al. · MRS Proceedings · 1999 · 10 citations
Natural Sciences, Materials Engineering, Materials Science +12
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