K. Okashita

New method of Plasma doping with in-situ Helium pre-amorphization

Y. Sasaki, C.G. Jin, K. Okashita et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 2005 · 20 citations

Materials Science, Engineering, Applied Physics +4

Conformal doping for FinFETs and precise controllable shallow doping for planar FET manufacturing by a novel B<inf>2</inf>H<inf>6</inf>/Helium Self-Regulatory Plasma Doping process

Y. Sasaki, K. Okashita, Keiichi NAKAMOTO et al. · 2008 · 18 citations

Semiconductor Technology, Electrical Engineering, New Srpd +14

Conformal doping mechanism for fin field effect transistors by self-regulatory plasma doping with AsH3 plasma diluted with He

Y. Sasaki, K. Okashita, Bunji Mizuo et al. · Journal of Applied Physics · 2012 · 18 citations

Materials Engineering, Semiconductor Technology, Electrical Engineering +12

Production-Worthy USJ Formation by Self-Regulatory Plasma Doping Method

Y. Sasaki, Hideki Ito, K. Okashita et al. · AIP conference proceedings · 2006 · 10 citations