F.J.H. van Assche

High-rate deposition of a-SiNx:H for photovoltaic applications by the expanding thermal plasma

W. M. M. Kessels, Joonhwa Hong, F.J.H. van Assche et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2002 · 39 citations · Full text

Engineering, Plasma Science, Silicon On Insulator +16

Plasma diagnostic study of silicon nitride film growth in a remote Ar–H2–N2–SiH4 plasma: Role of N and SiHn radicals

W. M. M. Kessels, F.J.H. van Assche, Joonhwa Hong et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2003 · 39 citations · Full text

High Sih3 Density, Engineering, Physics +14

Bulk passivation of multicrystalline silicon solar cells induced by high‐rate‐deposited (> 1 nm/s) silicon nitride films

Joonhwa Hong, W. M. M. Kessels, F.J.H. van Assche et al. · Progress in Photovoltaics Research and Applications · 2002 · 24 citations

Engineering, Photovoltaics, Plasma Processing +17

On the intrinsic moisture permeation rate of remote microwave plasma-deposited silicon nitride layers

F.J.H. van Assche, Sandeep Unnikrishnan, Jasper J. Michels et al. · Thin Solid Films · 2014 · 23 citations

Plasma-deposited Silicon, Physics, Applied Physics +4

P‐111: A Thin Film Encapsulation Stack for PLED and OLED Displays

F.J.H. van Assche, Rik Vangheluwe, Jochen Maes et al. · SID Symposium Digest of Technical Papers · 2004 · 22 citations · Full text

Materials Science, Device Encapsulation, Engineering +14