Pulikanti Guruprasad Reddy

Recent advances in non-chemically amplified photoresists for next generation IC technology

Subrata Ghosh, Chullikkattil P. Pradeep, Satinder K. Sharma et al. · RSC Advances · 2016 · 59 citations

Photoelectric Sensor, Engineering, Beam Lithography +13

EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer

Cleverson Alves da Silva Moura, Guilherme Kretzmann Belmonte, Pulikanti Guruprasad Reddy et al. · RSC Advances · 2018 · 37 citations · Full text

Design, development, EUVL applications and nano mechanical properties of a new HfO₂ based hybrid non-chemically amplified resist

Pulikanti Guruprasad Reddy, Narsimha Mamidi, Pawan Kumar et al. · RSC Advances · 2016 · 36 citations

Materials Science, Materials Engineering, Nano Mechanical Properties +13

Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications

Pulikanti Guruprasad Reddy, Satyendra Prakash Pal, Pawan Kumar et al. · ACS Applied Materials & Interfaces · 2016 · 34 citations

Optical Materials, Engineering, Electron-beam Lithography +18

Mechanistic insights of Sn-based non-chemically-amplified resists under EUV irradiation

Guilherme Kretzmann Belmonte, Suelen Weimer Cendron, Pulikanti Guruprasad Reddy et al. · Applied Surface Science · 2020 · 25 citations

Specific Resistance, Resistor, Applied Physics +2