Geoffrey W. Reynolds

Factors contributing to sidewall roughness in a positive-tone, chemically amplified resist exposed by x-ray lithography

Geoffrey W. Reynolds, James W. Taylor · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 96 citations

Engineering, Electron-beam Lithography, Radiation Effect +20

Correlation of atomic force microscopy sidewall roughness measurements with scanning electron microscopy line-edge roughness measurements on chemically amplified resists exposed by x-ray lithography

Geoffrey W. Reynolds, James W. Taylor · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 35 citations

Engineering, Electron-beam Lithography, Microscopy +18

Characterizing the rheology, slip, and velocity profiles of lamellar gel networks

Anukta Datta, Velidanda S. Tanmay, Grace Tan et al. · Journal of Rheology · 2020 · 30 citations

Scanning force microscopy measurements of latent image topography in chemically amplified resists

Leonidas E. Ocola, David S. Fryer, Geoffrey W. Reynolds et al. · Applied Physics Letters · 1996 · 28 citations

Optical Materials, Engineering, Electron-beam Lithography +23

Self-ion sputtering yields for copper, nickel, and aluminum

R.G. Allas, A.R. Knudson, J.M. Lambert et al. · Nuclear Instruments and Methods in Physics Research · 1982 · 25 citations

Materials Engineering, Materials Science, Engineering +7